Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array

Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array

10.1007/s00339-003-2343-x

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Bibliographic Details
Main Authors: Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.K., Fuller, S.E.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55283
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Institution: National University of Singapore
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Summary:10.1007/s00339-003-2343-x

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