Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array

• Main Authors: Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.K., Fuller, S.E.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/55283
• Institution: National University of Singapore

10.1007/s00339-003-2343-x