Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array

10.1007/s00339-003-2343-x

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Bibliographic Details
Main Authors:	Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.K., Fuller, S.E.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55283
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-55283
record_format	dspace
spelling	sg-nus-scholar.10635-552832023-10-25T20:35:06Z Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.K. Fuller, S.E. ELECTRICAL & COMPUTER ENGINEERING 10.1007/s00339-003-2343-x Applied Physics A: Materials Science and Processing 80 4 899-902 APAMF 2014-06-17T02:41:18Z 2014-06-17T02:41:18Z 2005-02 Article Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.K., Fuller, S.E. (2005-02). Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array. Applied Physics A: Materials Science and Processing 80 (4) : 899-902. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-003-2343-x 09478396 http://scholarbank.nus.edu.sg/handle/10635/55283 000226460900042 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1007/s00339-003-2343-x
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.K. Fuller, S.E.
format	Article
author	Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.K. Fuller, S.E.
spellingShingle	Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.K. Fuller, S.E. Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
author_sort	Schaper, C.D.
title	Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
title_short	Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
title_full	Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
title_fullStr	Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
title_full_unstemmed	Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
title_sort	characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/55283
_version_	1781412103198867456

Characterizing photolithographic linewidth sensitivity to process temperature variations for advanced resists using a thermal array

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