Dependence of leakage mechanisms on dielectric barrier in Cu-SiOC damascene interconnects

10.1063/1.1688978

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Bibliographic Details
Main Authors: Ngwan, V.C., Zhu, C., Krishnamoorthy, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55525
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Institution: National University of Singapore