Diameter dependence of the void formation in the oxidation of nickel nanowires

10.1088/0957-4484/22/23/235606

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Bibliographic Details
Main Authors:	Ren, Y., Chiam, S.Y., Chim, W.K.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55630
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Institution:	National University of Singapore

Description
Summary:	10.1088/0957-4484/22/23/235606

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