Electromigration resistance in a short three-contact interconnect tree

10.1063/1.2196114

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Bibliographic Details
Main Authors:	Chang, C.W., Choi, Z.-S., Thompson, C.V., Gan, C.L., Pey, K.L., Choi, W.K., Hwang, N.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55850
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Institution:	National University of Singapore

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