Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs

10.1063/1.2732821

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Main Authors:	Dalapati, G.K., Tong, Y., Loh, W.Y., Mun, H.K., Cho, B.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/56265
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-56265
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spelling	sg-nus-scholar.10635-562652023-10-26T07:43:37Z Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs Dalapati, G.K. Tong, Y. Loh, W.Y. Mun, H.K. Cho, B.J. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2732821 Applied Physics Letters 90 18 - APPLA 2014-06-17T02:52:38Z 2014-06-17T02:52:38Z 2007 Article Dalapati, G.K., Tong, Y., Loh, W.Y., Mun, H.K., Cho, B.J. (2007). Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs. Applied Physics Letters 90 (18) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2732821 00036951 http://scholarbank.nus.edu.sg/handle/10635/56265 000246210000134 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2732821
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Dalapati, G.K. Tong, Y. Loh, W.Y. Mun, H.K. Cho, B.J.
format	Article
author	Dalapati, G.K. Tong, Y. Loh, W.Y. Mun, H.K. Cho, B.J.
spellingShingle	Dalapati, G.K. Tong, Y. Loh, W.Y. Mun, H.K. Cho, B.J. Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs
author_sort	Dalapati, G.K.
title	Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs
title_short	Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs
title_full	Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs
title_fullStr	Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs
title_full_unstemmed	Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs
title_sort	impact of interfacial layer control using gd2 o3 in hf o2 gate dielectric on gaas
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/56265
_version_	1781781140449787904

Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs

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