Impact of interfacial layer control using Gd2 O3 in Hf O2 gate dielectric on GaAs

• Main Authors: Dalapati, G.K., Tong, Y., Loh, W.Y., Mun, H.K., Cho, B.J.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/56265
• Institution: National University of Singapore

10.1063/1.2732821