Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems

10.1116/1.1501583

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Bibliographic Details
Main Authors: Kok, K.W., Yoo, W.J., Sooriakumar, K., Pan, J.S., Lee, E.Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56399
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-563992023-10-29T23:04:12Z Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems Kok, K.W. Yoo, W.J. Sooriakumar, K. Pan, J.S. Lee, E.Y. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.1501583 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 5 1878-1883 JVTBD 2014-06-17T02:54:09Z 2014-06-17T02:54:09Z 2002-09 Article Kok, K.W., Yoo, W.J., Sooriakumar, K., Pan, J.S., Lee, E.Y. (2002-09). Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 (5) : 1878-1883. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1501583 10711023 http://scholarbank.nus.edu.sg/handle/10635/56399 000178669200013 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.1501583
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Kok, K.W.
Yoo, W.J.
Sooriakumar, K.
Pan, J.S.
Lee, E.Y.
format Article
author Kok, K.W.
Yoo, W.J.
Sooriakumar, K.
Pan, J.S.
Lee, E.Y.
spellingShingle Kok, K.W.
Yoo, W.J.
Sooriakumar, K.
Pan, J.S.
Lee, E.Y.
Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems
author_sort Kok, K.W.
title Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems
title_short Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems
title_full Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems
title_fullStr Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems
title_full_unstemmed Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems
title_sort investigation of in situ trench etching process and bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/56399
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