Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems

10.1116/1.1501583

Saved in:
Bibliographic Details
Main Authors: Kok, K.W., Yoo, W.J., Sooriakumar, K., Pan, J.S., Lee, E.Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56399
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items