Investigation of wet etching properties and annealing effects of Hf-based high-k materials

Investigation of wet etching properties and annealing effects of Hf-based high-k materials

10.1149/1.2184929

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Bibliographic Details
Main Authors: Chen, J., Jong Yoo, W., Chan, D.S.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56410
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Institution: National University of Singapore
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Summary:10.1149/1.2184929

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