Investigation of wet etching properties and annealing effects of Hf-based high-k materials
10.1149/1.2184929
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sg-nus-scholar.10635-564102023-10-29T23:01:19Z Investigation of wet etching properties and annealing effects of Hf-based high-k materials Chen, J. Jong Yoo, W. Chan, D.S.H. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2184929 Journal of the Electrochemical Society 153 5 G483-G491 JESOA 2014-06-17T02:54:16Z 2014-06-17T02:54:16Z 2006 Article Chen, J., Jong Yoo, W., Chan, D.S.H. (2006). Investigation of wet etching properties and annealing effects of Hf-based high-k materials. Journal of the Electrochemical Society 153 (5) : G483-G491. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2184929 00134651 http://scholarbank.nus.edu.sg/handle/10635/56410 000236516000077 Scopus |
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10.1149/1.2184929 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Chen, J. Jong Yoo, W. Chan, D.S.H. |
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Chen, J. Jong Yoo, W. Chan, D.S.H. |
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Chen, J. Jong Yoo, W. Chan, D.S.H. Investigation of wet etching properties and annealing effects of Hf-based high-k materials |
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Chen, J. |
title |
Investigation of wet etching properties and annealing effects of Hf-based high-k materials |
title_short |
Investigation of wet etching properties and annealing effects of Hf-based high-k materials |
title_full |
Investigation of wet etching properties and annealing effects of Hf-based high-k materials |
title_fullStr |
Investigation of wet etching properties and annealing effects of Hf-based high-k materials |
title_full_unstemmed |
Investigation of wet etching properties and annealing effects of Hf-based high-k materials |
title_sort |
investigation of wet etching properties and annealing effects of hf-based high-k materials |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/56410 |
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