Investigation of wet etching properties and annealing effects of Hf-based high-k materials
10.1149/1.2184929
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Main Authors: | Chen, J., Jong Yoo, W., Chan, D.S.H. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56410 |
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Institution: | National University of Singapore |
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