Metal gate technology for nanoscale transistors - Material selection and process integration issues

10.1016/j.tsf.2004.05.039

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Bibliographic Details
Main Author:	Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	High-k dielectric materials Metal gate Transistor Work function
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/56607
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-56607
record_format	dspace
spelling	sg-nus-scholar.10635-566072024-11-08T16:45:12Z Metal gate technology for nanoscale transistors - Material selection and process integration issues Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING High-k dielectric materials Metal gate Transistor Work function 10.1016/j.tsf.2004.05.039 Thin Solid Films 462-463 SPEC. ISS. 34-41 THSFA 2014-06-17T02:56:31Z 2014-06-17T02:56:31Z 2004-09 Article Yeo, Y.-C. (2004-09). Metal gate technology for nanoscale transistors - Material selection and process integration issues. Thin Solid Films 462-463 (SPEC. ISS.) : 34-41. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2004.05.039 00406090 http://scholarbank.nus.edu.sg/handle/10635/56607 000223812800009 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	High-k dielectric materials Metal gate Transistor Work function
spellingShingle	High-k dielectric materials Metal gate Transistor Work function Yeo, Y.-C. Metal gate technology for nanoscale transistors - Material selection and process integration issues
description	10.1016/j.tsf.2004.05.039
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Yeo, Y.-C.
format	Article
author	Yeo, Y.-C.
author_sort	Yeo, Y.-C.
title	Metal gate technology for nanoscale transistors - Material selection and process integration issues
title_short	Metal gate technology for nanoscale transistors - Material selection and process integration issues
title_full	Metal gate technology for nanoscale transistors - Material selection and process integration issues
title_fullStr	Metal gate technology for nanoscale transistors - Material selection and process integration issues
title_full_unstemmed	Metal gate technology for nanoscale transistors - Material selection and process integration issues
title_sort	metal gate technology for nanoscale transistors - material selection and process integration issues
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/56607
_version_	1821195850833985536

Metal gate technology for nanoscale transistors - Material selection and process integration issues

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