Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography

10.1116/1.1978893

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Bibliographic Details
Main Authors: An, L., Zheng, Y., Li, K., Luo, P., Wu, Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56759
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Institution: National University of Singapore