Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography
10.1116/1.1978893
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sg-nus-scholar.10635-567592023-10-26T07:18:05Z Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography An, L. Zheng, Y. Li, K. Luo, P. Wu, Y. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.1978893 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 23 4 1603-1606 JVTBD 2014-06-17T02:58:18Z 2014-06-17T02:58:18Z 2005 Article An, L., Zheng, Y., Li, K., Luo, P., Wu, Y. (2005). Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 23 (4) : 1603-1606. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1978893 10711023 http://scholarbank.nus.edu.sg/handle/10635/56759 000231211500044 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
10.1116/1.1978893 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING An, L. Zheng, Y. Li, K. Luo, P. Wu, Y. |
| format |
Article |
| author |
An, L. Zheng, Y. Li, K. Luo, P. Wu, Y. |
| spellingShingle |
An, L. Zheng, Y. Li, K. Luo, P. Wu, Y. Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography |
| author_sort |
An, L. |
| title |
Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography |
| title_short |
Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography |
| title_full |
Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography |
| title_fullStr |
Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography |
| title_full_unstemmed |
Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography |
| title_sort |
nanometer metal line fabrication using a zep52050 k pmma bilayer resist by e-beam lithography |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/56759 |
| _version_ |
1781781272930025472 |