Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography
10.1116/1.1978893
Saved in:
Main Authors: | An, L., Zheng, Y., Li, K., Luo, P., Wu, Y. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56759 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
by: Puttaraksa N., et al.
Published: (2014) -
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
by: Puttaraksa N., et al.
Published: (2014) -
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
by: Puttaraksa,N., et al.
Published: (2015) -
Proton beam fabrication of nickel stamps for nanoimprint lithography
by: Ansari, K., et al.
Published: (2014) -
Maskless multiple-beam laser lithography for largearea nanostructure/ microstructure fabrication
by: Tang, M., et al.
Published: (2014)