On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack
10.1063/1.2783967
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sg-nus-scholar.10635-568932023-10-26T07:18:15Z On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack Samanta, P. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2783967 Applied Physics Letters 91 11 - APPLA 2014-06-17T02:59:52Z 2014-06-17T02:59:52Z 2007 Article Samanta, P., Zhu, C., Chan, M. (2007). On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack. Applied Physics Letters 91 (11) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2783967 00036951 http://scholarbank.nus.edu.sg/handle/10635/56893 000249474000107 Scopus |
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10.1063/1.2783967 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Samanta, P. Zhu, C. Chan, M. |
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Samanta, P. Zhu, C. Chan, M. |
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Samanta, P. Zhu, C. Chan, M. On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack |
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Samanta, P. |
title |
On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack |
title_short |
On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack |
title_full |
On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack |
title_fullStr |
On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack |
title_full_unstemmed |
On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack |
title_sort |
on the electrical stress-induced oxide-trapped charges in thin hf o2 si o2 gate dielectric stack |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/56893 |
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