On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack

10.1063/1.2783967

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Main Authors: Samanta, P., Zhu, C., Chan, M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56893
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-568932023-10-26T07:18:15Z On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack Samanta, P. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2783967 Applied Physics Letters 91 11 - APPLA 2014-06-17T02:59:52Z 2014-06-17T02:59:52Z 2007 Article Samanta, P., Zhu, C., Chan, M. (2007). On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack. Applied Physics Letters 91 (11) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2783967 00036951 http://scholarbank.nus.edu.sg/handle/10635/56893 000249474000107 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.2783967
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Samanta, P.
Zhu, C.
Chan, M.
format Article
author Samanta, P.
Zhu, C.
Chan, M.
spellingShingle Samanta, P.
Zhu, C.
Chan, M.
On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack
author_sort Samanta, P.
title On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack
title_short On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack
title_full On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack
title_fullStr On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack
title_full_unstemmed On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack
title_sort on the electrical stress-induced oxide-trapped charges in thin hf o2 si o2 gate dielectric stack
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/56893
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