Processing chemically amplified resists on advanced photomasks using a thermal array

Processing chemically amplified resists on advanced photomasks using a thermal array

10.1016/j.mee.2003.09.006

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Bibliographic Details
Main Authors: Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.-K., Fuller, S.E.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57129
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Institution: National University of Singapore
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Summary:10.1016/j.mee.2003.09.006

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