Processing chemically amplified resists on advanced photomasks using a thermal array

10.1016/j.mee.2003.09.006

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Bibliographic Details
Main Authors:	Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.-K., Fuller, S.E.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/57129
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-57129
record_format	dspace
spelling	sg-nus-scholar.10635-571292023-10-27T08:04:34Z Processing chemically amplified resists on advanced photomasks using a thermal array Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.-K. Fuller, S.E. ELECTRICAL & COMPUTER ENGINEERING 10.1016/j.mee.2003.09.006 Microelectronic Engineering 71 1 63-68 MIENE 2014-06-17T03:02:36Z 2014-06-17T03:02:36Z 2004-01 Article Schaper, C.D., El-Awady, K., Kailath, T., Tay, A., Lee, L.L., Ho, W.-K., Fuller, S.E. (2004-01). Processing chemically amplified resists on advanced photomasks using a thermal array. Microelectronic Engineering 71 (1) : 63-68. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2003.09.006 01679317 http://scholarbank.nus.edu.sg/handle/10635/57129 000188002800008 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1016/j.mee.2003.09.006
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.-K. Fuller, S.E.
format	Article
author	Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.-K. Fuller, S.E.
spellingShingle	Schaper, C.D. El-Awady, K. Kailath, T. Tay, A. Lee, L.L. Ho, W.-K. Fuller, S.E. Processing chemically amplified resists on advanced photomasks using a thermal array
author_sort	Schaper, C.D.
title	Processing chemically amplified resists on advanced photomasks using a thermal array
title_short	Processing chemically amplified resists on advanced photomasks using a thermal array
title_full	Processing chemically amplified resists on advanced photomasks using a thermal array
title_fullStr	Processing chemically amplified resists on advanced photomasks using a thermal array
title_full_unstemmed	Processing chemically amplified resists on advanced photomasks using a thermal array
title_sort	processing chemically amplified resists on advanced photomasks using a thermal array
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/57129
_version_	1781781352691007488

Processing chemically amplified resists on advanced photomasks using a thermal array

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