Processing chemically amplified resists on advanced photomasks using a thermal array
10.1016/j.mee.2003.09.006
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| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
2014
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| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/57129 |
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| Institution: | National University of Singapore |