Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons

IEEE Transactions on Electron Devices

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Bibliographic Details
Main Authors: Chin, S.K., Ligatchev, V., Rustagi, S.C., Zhao, H., Samudra, G.S., Singh, N., Lo, G.Q., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
MOS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57365
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-573652023-08-25T08:21:46Z Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons Chin, S.K. Ligatchev, V. Rustagi, S.C. Zhao, H. Samudra, G.S. Singh, N. Lo, G.Q. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Capacitance Gate-all-around MOS Schrödinger-Poisson (SP) Silicon (Si) nanowire IEEE Transactions on Electron Devices 56 10 2312-2318 IETDA 2014-06-17T03:05:22Z 2014-06-17T03:05:22Z 2009 Article Chin, S.K., Ligatchev, V., Rustagi, S.C., Zhao, H., Samudra, G.S., Singh, N., Lo, G.Q., Kwong, D.-L. (2009). Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons. IEEE Transactions on Electron Devices 56 (10) : 2312-2318. ScholarBank@NUS Repository. 00189383 http://scholarbank.nus.edu.sg/handle/10635/57365 000270036300019 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Capacitance
Gate-all-around
MOS
Schrödinger-Poisson (SP)
Silicon (Si) nanowire
spellingShingle Capacitance
Gate-all-around
MOS
Schrödinger-Poisson (SP)
Silicon (Si) nanowire
Chin, S.K.
Ligatchev, V.
Rustagi, S.C.
Zhao, H.
Samudra, G.S.
Singh, N.
Lo, G.Q.
Kwong, D.-L.
Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons
description IEEE Transactions on Electron Devices
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Chin, S.K.
Ligatchev, V.
Rustagi, S.C.
Zhao, H.
Samudra, G.S.
Singh, N.
Lo, G.Q.
Kwong, D.-L.
format Article
author Chin, S.K.
Ligatchev, V.
Rustagi, S.C.
Zhao, H.
Samudra, G.S.
Singh, N.
Lo, G.Q.
Kwong, D.-L.
author_sort Chin, S.K.
title Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons
title_short Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons
title_full Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons
title_fullStr Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons
title_full_unstemmed Self-consistent Schrödinger-Poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around MOS devices with experimental comparisons
title_sort self-consistent schrödinger-poisson simulations on capacitance-voltage characteristics of silicon nanowire gate-all-around mos devices with experimental comparisons
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/57365
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