The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide

IEEE Electron Device Letters

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Bibliographic Details
Main Authors:	Lin, W.H., Pey, K.L., Dong, Z., Chooi, S.Y.M., Ang, C.H., Zheng, J.Z.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/57638
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-57638
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spelling	sg-nus-scholar.10635-576382023-08-25T08:22:53Z The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z. ELECTRICAL & COMPUTER ENGINEERING CHEMICAL & ENVIRONMENTAL ENGINEERING Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution IEEE Electron Device Letters 24 5 336-338 EDLED 2014-06-17T03:08:29Z 2014-06-17T03:08:29Z 2003-05 Article Lin, W.H., Pey, K.L., Dong, Z., Chooi, S.Y.M., Ang, C.H., Zheng, J.Z. (2003-05). The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide. IEEE Electron Device Letters 24 (5) : 336-338. ScholarBank@NUS Repository. 07413106 http://scholarbank.nus.edu.sg/handle/10635/57638 000184064600017 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution
spellingShingle	Percolation path Soft breakdown Ultrathin gate oxide Weibull distribution Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z. The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
description	IEEE Electron Device Letters
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z.
format	Article
author	Lin, W.H. Pey, K.L. Dong, Z. Chooi, S.Y.M. Ang, C.H. Zheng, J.Z.
author_sort	Lin, W.H.
title	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_short	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_full	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_fullStr	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_full_unstemmed	The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
title_sort	statistical distribution of percolation current for soft breakdown in ultrathin gate oxide
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/57638
_version_	1775627430439944192

The statistical distribution of percolation current for soft breakdown in ultrathin gate oxide

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