Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation

10.1063/1.2940596

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Main Authors: Sinha, M., Chor, E.F., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57724
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-577242023-10-25T21:10:35Z Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation Sinha, M. Chor, E.F. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2940596 Applied Physics Letters 92 22 - APPLA 2014-06-17T03:09:27Z 2014-06-17T03:09:27Z 2008 Article Sinha, M., Chor, E.F., Yeo, Y.-C. (2008). Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation. Applied Physics Letters 92 (22) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2940596 00036951 http://scholarbank.nus.edu.sg/handle/10635/57724 000256527900049 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.2940596
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Sinha, M.
Chor, E.F.
Yeo, Y.-C.
format Article
author Sinha, M.
Chor, E.F.
Yeo, Y.-C.
spellingShingle Sinha, M.
Chor, E.F.
Yeo, Y.-C.
Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation
author_sort Sinha, M.
title Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation
title_short Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation
title_full Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation
title_fullStr Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation
title_full_unstemmed Tuning the Schottky barrier height of nickel silicide on p -silicon by aluminum segregation
title_sort tuning the schottky barrier height of nickel silicide on p -silicon by aluminum segregation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/57724
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