Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution
10.1016/j.surfcoat.2004.10.094
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2014
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sg-nus-scholar.10635-596982023-10-30T08:12:12Z Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution Iliescu, C. Jing, J. Tay, F.E.H. Miao, J. Sun, T. MECHANICAL ENGINEERING Masking layers Surface roughness Wet etching of glass 10.1016/j.surfcoat.2004.10.094 Surface and Coatings Technology 198 1-3 SPEC. ISS. 314-318 2014-06-17T06:14:33Z 2014-06-17T06:14:33Z 2005-08-01 Article Iliescu, C., Jing, J., Tay, F.E.H., Miao, J., Sun, T. (2005-08-01). Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution. Surface and Coatings Technology 198 (1-3 SPEC. ISS.) : 314-318. ScholarBank@NUS Repository. https://doi.org/10.1016/j.surfcoat.2004.10.094 02578972 http://scholarbank.nus.edu.sg/handle/10635/59698 000230419400066 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| topic |
Masking layers Surface roughness Wet etching of glass |
| spellingShingle |
Masking layers Surface roughness Wet etching of glass Iliescu, C. Jing, J. Tay, F.E.H. Miao, J. Sun, T. Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution |
| description |
10.1016/j.surfcoat.2004.10.094 |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING Iliescu, C. Jing, J. Tay, F.E.H. Miao, J. Sun, T. |
| format |
Article |
| author |
Iliescu, C. Jing, J. Tay, F.E.H. Miao, J. Sun, T. |
| author_sort |
Iliescu, C. |
| title |
Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution |
| title_short |
Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution |
| title_full |
Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution |
| title_fullStr |
Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution |
| title_full_unstemmed |
Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution |
| title_sort |
characterization of masking layers for deep wet etching of glass in an improved hf/hcl solution |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/59698 |
| _version_ |
1781781682332893184 |