Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution

Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution

10.1016/j.surfcoat.2004.10.094

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Bibliographic Details
Main Authors: Iliescu, C., Jing, J., Tay, F.E.H., Miao, J., Sun, T.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Masking layers
Surface roughness
Wet etching of glass
Online Access:http://scholarbank.nus.edu.sg/handle/10635/59698
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Institution: National University of Singapore

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