Circular apertures for contact hole patterning in 193 nm immersion lithography
10.1116/1.3546100
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sg-nus-scholar.10635-597092023-10-29T22:52:12Z Circular apertures for contact hole patterning in 193 nm immersion lithography Tay, C.J. Quan, C. Ling, M.L. Chua, G.S. Tan, S.K. Lin, Q. MECHANICAL ENGINEERING 10.1116/1.3546100 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 29 2 - JVTBD 2014-06-17T06:14:42Z 2014-06-17T06:14:42Z 2011-03 Article Tay, C.J., Quan, C., Ling, M.L., Chua, G.S., Tan, S.K., Lin, Q. (2011-03). Circular apertures for contact hole patterning in 193 nm immersion lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 29 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3546100 10711023 http://scholarbank.nus.edu.sg/handle/10635/59709 000289166000008 Scopus |
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MECHANICAL ENGINEERING |
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MECHANICAL ENGINEERING Tay, C.J. Quan, C. Ling, M.L. Chua, G.S. Tan, S.K. Lin, Q. |
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Tay, C.J. Quan, C. Ling, M.L. Chua, G.S. Tan, S.K. Lin, Q. |
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Tay, C.J. Quan, C. Ling, M.L. Chua, G.S. Tan, S.K. Lin, Q. Circular apertures for contact hole patterning in 193 nm immersion lithography |
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Tay, C.J. |
title |
Circular apertures for contact hole patterning in 193 nm immersion lithography |
title_short |
Circular apertures for contact hole patterning in 193 nm immersion lithography |
title_full |
Circular apertures for contact hole patterning in 193 nm immersion lithography |
title_fullStr |
Circular apertures for contact hole patterning in 193 nm immersion lithography |
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Circular apertures for contact hole patterning in 193 nm immersion lithography |
title_sort |
circular apertures for contact hole patterning in 193 nm immersion lithography |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/59709 |
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