Circular apertures for contact hole patterning in 193 nm immersion lithography

10.1116/1.3546100

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Bibliographic Details
Main Authors: Tay, C.J., Quan, C., Ling, M.L., Chua, G.S., Tan, S.K., Lin, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/59709
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-597092023-10-29T22:52:12Z Circular apertures for contact hole patterning in 193 nm immersion lithography Tay, C.J. Quan, C. Ling, M.L. Chua, G.S. Tan, S.K. Lin, Q. MECHANICAL ENGINEERING 10.1116/1.3546100 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 29 2 - JVTBD 2014-06-17T06:14:42Z 2014-06-17T06:14:42Z 2011-03 Article Tay, C.J., Quan, C., Ling, M.L., Chua, G.S., Tan, S.K., Lin, Q. (2011-03). Circular apertures for contact hole patterning in 193 nm immersion lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 29 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3546100 10711023 http://scholarbank.nus.edu.sg/handle/10635/59709 000289166000008 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.3546100
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Tay, C.J.
Quan, C.
Ling, M.L.
Chua, G.S.
Tan, S.K.
Lin, Q.
format Article
author Tay, C.J.
Quan, C.
Ling, M.L.
Chua, G.S.
Tan, S.K.
Lin, Q.
spellingShingle Tay, C.J.
Quan, C.
Ling, M.L.
Chua, G.S.
Tan, S.K.
Lin, Q.
Circular apertures for contact hole patterning in 193 nm immersion lithography
author_sort Tay, C.J.
title Circular apertures for contact hole patterning in 193 nm immersion lithography
title_short Circular apertures for contact hole patterning in 193 nm immersion lithography
title_full Circular apertures for contact hole patterning in 193 nm immersion lithography
title_fullStr Circular apertures for contact hole patterning in 193 nm immersion lithography
title_full_unstemmed Circular apertures for contact hole patterning in 193 nm immersion lithography
title_sort circular apertures for contact hole patterning in 193 nm immersion lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/59709
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