Circular apertures for contact hole patterning in 193 nm immersion lithography

10.1116/1.3546100

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Bibliographic Details
Main Authors: Tay, C.J., Quan, C., Ling, M.L., Chua, G.S., Tan, S.K., Lin, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/59709
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Institution: National University of Singapore
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