Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation

10.1109/16.824744

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Main Authors:	Ling, C.H., Ang, C.H., Ang, D.S.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/61931
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-61931
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spelling	sg-nus-scholar.10635-619312023-10-30T07:52:52Z Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation Ling, C.H. Ang, C.H. Ang, D.S. ELECTRICAL ENGINEERING BACHELOR OF TECHNOLOGY PROGRAMME 10.1109/16.824744 IEEE Transactions on Electron Devices 47 3 650-652 IETDA 2014-06-17T06:45:35Z 2014-06-17T06:45:35Z 2000 Article Ling, C.H., Ang, C.H., Ang, D.S. (2000). Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation. IEEE Transactions on Electron Devices 47 (3) : 650-652. ScholarBank@NUS Repository. https://doi.org/10.1109/16.824744 00189383 http://scholarbank.nus.edu.sg/handle/10635/61931 000085766300024 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/16.824744
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Ling, C.H. Ang, C.H. Ang, D.S.
format	Article
author	Ling, C.H. Ang, C.H. Ang, D.S.
spellingShingle	Ling, C.H. Ang, C.H. Ang, D.S. Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation
author_sort	Ling, C.H.
title	Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation
title_short	Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation
title_full	Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation
title_fullStr	Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation
title_full_unstemmed	Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation
title_sort	characterization of leakage current in thin gate oxide subjected to 10 kev x-ray irradiation
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/61931
_version_	1781782122352082944

Characterization of leakage current in thin gate oxide subjected to 10 KeV X-ray irradiation

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