Radiation-induced leakage current of ultra-thin gate oxide under X-ray lithography conditions

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Bibliographic Details
Main Authors: Cho, Byung Jin, Kim, Sun Jung, Ling, C.H., Joo, Moon Sig, Yeo, In Seok
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/72877
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Institution: National University of Singapore