A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio

A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio

10.1088/0960-1317/23/3/035038

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Bibliographic Details
Main Authors: Zong, B.Y., Ho, P., Han, G.C., Chow, G.M., Chen, J.S.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/64802
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/64802

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