A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio

10.1088/0960-1317/23/3/035038

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Bibliographic Details
Main Authors:	Zong, B.Y., Ho, P., Han, G.C., Chow, G.M., Chen, J.S.
Other Authors:	MATERIALS SCIENCE AND ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/64802
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Institution:	National University of Singapore

Description
Summary:	10.1088/0960-1317/23/3/035038

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