A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio

10.1088/0960-1317/23/3/035038

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Bibliographic Details
Main Authors: Zong, B.Y., Ho, P., Han, G.C., Chow, G.M., Chen, J.S.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/64802
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-648022023-10-26T08:35:03Z A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio Zong, B.Y. Ho, P. Han, G.C. Chow, G.M. Chen, J.S. MATERIALS SCIENCE AND ENGINEERING 10.1088/0960-1317/23/3/035038 Journal of Micromechanics and Microengineering 23 3 - JMMIE 2014-06-17T07:57:40Z 2014-06-17T07:57:40Z 2013-03 Article Zong, B.Y., Ho, P., Han, G.C., Chow, G.M., Chen, J.S. (2013-03). A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio. Journal of Micromechanics and Microengineering 23 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0960-1317/23/3/035038 09601317 http://scholarbank.nus.edu.sg/handle/10635/64802 000314816800039 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1088/0960-1317/23/3/035038
author2 MATERIALS SCIENCE AND ENGINEERING
author_facet MATERIALS SCIENCE AND ENGINEERING
Zong, B.Y.
Ho, P.
Han, G.C.
Chow, G.M.
Chen, J.S.
format Article
author Zong, B.Y.
Ho, P.
Han, G.C.
Chow, G.M.
Chen, J.S.
spellingShingle Zong, B.Y.
Ho, P.
Han, G.C.
Chow, G.M.
Chen, J.S.
A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
author_sort Zong, B.Y.
title A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
title_short A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
title_full A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
title_fullStr A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
title_full_unstemmed A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
title_sort simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/64802
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