A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio
10.1088/0960-1317/23/3/035038
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sg-nus-scholar.10635-648022023-10-26T08:35:03Z A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio Zong, B.Y. Ho, P. Han, G.C. Chow, G.M. Chen, J.S. MATERIALS SCIENCE AND ENGINEERING 10.1088/0960-1317/23/3/035038 Journal of Micromechanics and Microengineering 23 3 - JMMIE 2014-06-17T07:57:40Z 2014-06-17T07:57:40Z 2013-03 Article Zong, B.Y., Ho, P., Han, G.C., Chow, G.M., Chen, J.S. (2013-03). A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio. Journal of Micromechanics and Microengineering 23 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0960-1317/23/3/035038 09601317 http://scholarbank.nus.edu.sg/handle/10635/64802 000314816800039 Scopus |
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10.1088/0960-1317/23/3/035038 |
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MATERIALS SCIENCE AND ENGINEERING |
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MATERIALS SCIENCE AND ENGINEERING Zong, B.Y. Ho, P. Han, G.C. Chow, G.M. Chen, J.S. |
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Zong, B.Y. Ho, P. Han, G.C. Chow, G.M. Chen, J.S. |
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Zong, B.Y. Ho, P. Han, G.C. Chow, G.M. Chen, J.S. A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio |
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Zong, B.Y. |
title |
A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio |
title_short |
A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio |
title_full |
A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio |
title_fullStr |
A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio |
title_full_unstemmed |
A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio |
title_sort |
simple approach to sub-100 nm resist nanopatterns with a high aspect ratio |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/64802 |
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