A lamp thermoelectricity based integrated bake/chill system for advanced photoresist processing

10.1117/12.654331

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Bibliographic Details
Main Authors:	Tay, A., Chua, H.-T., Wu, X., Wang, Y.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/68847
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Institution:	National University of Singapore

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Summary:	10.1117/12.654331

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