A new approach for eliminating unwanted patterns in attenuated phase shift masks

A new approach for eliminating unwanted patterns in attenuated phase shift masks

10.1016/S0026-2692(03)00195-2

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Bibliographic Details
Main Authors: Mukherjee-Roy, M., Singh, N., Mehta, S.S., Samudra, G.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Attenuated phase shift masks
Masks
Optical microlithography
Online Access:http://scholarbank.nus.edu.sg/handle/10635/68912
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Institution: National University of Singapore
Description
Summary:10.1016/S0026-2692(03)00195-2

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