A new approach for eliminating unwanted patterns in attenuated phase shift masks

10.1016/S0026-2692(03)00195-2

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Bibliographic Details
Main Authors: Mukherjee-Roy, M., Singh, N., Mehta, S.S., Samudra, G.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/68912
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-689122023-10-29T23:37:27Z A new approach for eliminating unwanted patterns in attenuated phase shift masks Mukherjee-Roy, M. Singh, N. Mehta, S.S. Samudra, G.S. ELECTRICAL & COMPUTER ENGINEERING Attenuated phase shift masks Masks Optical microlithography 10.1016/S0026-2692(03)00195-2 Microelectronics Journal 34 10 965-967 MICEB 2014-06-19T02:54:39Z 2014-06-19T02:54:39Z 2003-10 Conference Paper Mukherjee-Roy, M., Singh, N., Mehta, S.S., Samudra, G.S. (2003-10). A new approach for eliminating unwanted patterns in attenuated phase shift masks. Microelectronics Journal 34 (10) : 965-967. ScholarBank@NUS Repository. https://doi.org/10.1016/S0026-2692(03)00195-2 00262692 http://scholarbank.nus.edu.sg/handle/10635/68912 000185869300012 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Attenuated phase shift masks
Masks
Optical microlithography
spellingShingle Attenuated phase shift masks
Masks
Optical microlithography
Mukherjee-Roy, M.
Singh, N.
Mehta, S.S.
Samudra, G.S.
A new approach for eliminating unwanted patterns in attenuated phase shift masks
description 10.1016/S0026-2692(03)00195-2
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Mukherjee-Roy, M.
Singh, N.
Mehta, S.S.
Samudra, G.S.
format Conference or Workshop Item
author Mukherjee-Roy, M.
Singh, N.
Mehta, S.S.
Samudra, G.S.
author_sort Mukherjee-Roy, M.
title A new approach for eliminating unwanted patterns in attenuated phase shift masks
title_short A new approach for eliminating unwanted patterns in attenuated phase shift masks
title_full A new approach for eliminating unwanted patterns in attenuated phase shift masks
title_fullStr A new approach for eliminating unwanted patterns in attenuated phase shift masks
title_full_unstemmed A new approach for eliminating unwanted patterns in attenuated phase shift masks
title_sort new approach for eliminating unwanted patterns in attenuated phase shift masks
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/68912
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