A new approach for eliminating unwanted patterns in attenuated phase shift masks
10.1016/S0026-2692(03)00195-2
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sg-nus-scholar.10635-689122023-10-29T23:37:27Z A new approach for eliminating unwanted patterns in attenuated phase shift masks Mukherjee-Roy, M. Singh, N. Mehta, S.S. Samudra, G.S. ELECTRICAL & COMPUTER ENGINEERING Attenuated phase shift masks Masks Optical microlithography 10.1016/S0026-2692(03)00195-2 Microelectronics Journal 34 10 965-967 MICEB 2014-06-19T02:54:39Z 2014-06-19T02:54:39Z 2003-10 Conference Paper Mukherjee-Roy, M., Singh, N., Mehta, S.S., Samudra, G.S. (2003-10). A new approach for eliminating unwanted patterns in attenuated phase shift masks. Microelectronics Journal 34 (10) : 965-967. ScholarBank@NUS Repository. https://doi.org/10.1016/S0026-2692(03)00195-2 00262692 http://scholarbank.nus.edu.sg/handle/10635/68912 000185869300012 Scopus |
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Attenuated phase shift masks Masks Optical microlithography |
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Attenuated phase shift masks Masks Optical microlithography Mukherjee-Roy, M. Singh, N. Mehta, S.S. Samudra, G.S. A new approach for eliminating unwanted patterns in attenuated phase shift masks |
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10.1016/S0026-2692(03)00195-2 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Mukherjee-Roy, M. Singh, N. Mehta, S.S. Samudra, G.S. |
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Conference or Workshop Item |
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Mukherjee-Roy, M. Singh, N. Mehta, S.S. Samudra, G.S. |
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Mukherjee-Roy, M. |
title |
A new approach for eliminating unwanted patterns in attenuated phase shift masks |
title_short |
A new approach for eliminating unwanted patterns in attenuated phase shift masks |
title_full |
A new approach for eliminating unwanted patterns in attenuated phase shift masks |
title_fullStr |
A new approach for eliminating unwanted patterns in attenuated phase shift masks |
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A new approach for eliminating unwanted patterns in attenuated phase shift masks |
title_sort |
new approach for eliminating unwanted patterns in attenuated phase shift masks |
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2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/68912 |
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