A new approach for eliminating unwanted patterns in attenuated phase shift masks

10.1016/S0026-2692(03)00195-2

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Bibliographic Details
Main Authors:	Mukherjee-Roy, M., Singh, N., Mehta, S.S., Samudra, G.S.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Attenuated phase shift masks Masks Optical microlithography
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/68912
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Institution:	National University of Singapore

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