A new approach for eliminating unwanted patterns in attenuated phase shift masks
10.1016/S0026-2692(03)00195-2
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Main Authors: | Mukherjee-Roy, M., Singh, N., Mehta, S.S., Samudra, G.S. |
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其他作者: | ELECTRICAL & COMPUTER ENGINEERING |
格式: | Conference or Workshop Item |
出版: |
2014
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在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/68912 |
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