Equipment design and process control of critical dimensions in lithography

Equipment design and process control of critical dimensions in lithography

10.1109/ICCA.2010.5524378

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Bibliographic Details
Main Authors: Ngo, Y.S., Yang, G., Putra, A.S., Ang, K.T., Tay, A., Fang, Z.P.
Other Authors: DEAN'S OFFICE (ENGINEERING)
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70194
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Institution: National University of Singapore
Description
Summary:10.1109/ICCA.2010.5524378

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