Equipment design and process control of critical dimensions in lithography
10.1109/ICCA.2010.5524378
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
|
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/70194 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-70194 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-701942015-01-09T18:53:03Z Equipment design and process control of critical dimensions in lithography Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. DEAN'S OFFICE (ENGINEERING) ELECTRICAL & COMPUTER ENGINEERING 10.1109/ICCA.2010.5524378 2010 8th IEEE International Conference on Control and Automation, ICCA 2010 1572-1577 2014-06-19T03:09:19Z 2014-06-19T03:09:19Z 2010 Conference Paper Ngo, Y.S.,Yang, G.,Putra, A.S.,Ang, K.T.,Tay, A.,Fang, Z.P. (2010). Equipment design and process control of critical dimensions in lithography. 2010 8th IEEE International Conference on Control and Automation, ICCA 2010 : 1572-1577. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ICCA.2010.5524378" target="_blank">https://doi.org/10.1109/ICCA.2010.5524378</a> 9781424451951 http://scholarbank.nus.edu.sg/handle/10635/70194 NOT_IN_WOS Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| country |
Singapore |
| collection |
ScholarBank@NUS |
| description |
10.1109/ICCA.2010.5524378 |
| author2 |
DEAN'S OFFICE (ENGINEERING) |
| author_facet |
DEAN'S OFFICE (ENGINEERING) Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. |
| format |
Conference or Workshop Item |
| author |
Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. |
| spellingShingle |
Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. Equipment design and process control of critical dimensions in lithography |
| author_sort |
Ngo, Y.S. |
| title |
Equipment design and process control of critical dimensions in lithography |
| title_short |
Equipment design and process control of critical dimensions in lithography |
| title_full |
Equipment design and process control of critical dimensions in lithography |
| title_fullStr |
Equipment design and process control of critical dimensions in lithography |
| title_full_unstemmed |
Equipment design and process control of critical dimensions in lithography |
| title_sort |
equipment design and process control of critical dimensions in lithography |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/70194 |
| _version_ |
1681087154030116864 |