Equipment design and process control of critical dimensions in lithography
10.1109/ICCA.2010.5524378
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sg-nus-scholar.10635-701942024-11-14T02:30:40Z Equipment design and process control of critical dimensions in lithography Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. ELECTRICAL & COMPUTER ENGINEERING DEAN'S OFFICE (ENGINEERING) 10.1109/ICCA.2010.5524378 2010 8th IEEE International Conference on Control and Automation, ICCA 2010 1572-1577 2014-06-19T03:09:19Z 2014-06-19T03:09:19Z 2010 Conference Paper Ngo, Y.S.,Yang, G.,Putra, A.S.,Ang, K.T.,Tay, A.,Fang, Z.P. (2010). Equipment design and process control of critical dimensions in lithography. 2010 8th IEEE International Conference on Control and Automation, ICCA 2010 : 1572-1577. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ICCA.2010.5524378" target="_blank">https://doi.org/10.1109/ICCA.2010.5524378</a> 9781424451951 http://scholarbank.nus.edu.sg/handle/10635/70194 NOT_IN_WOS Scopus |
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10.1109/ICCA.2010.5524378 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. |
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Conference or Workshop Item |
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Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. |
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Ngo, Y.S. Yang, G. Putra, A.S. Ang, K.T. Tay, A. Fang, Z.P. Equipment design and process control of critical dimensions in lithography |
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Ngo, Y.S. |
title |
Equipment design and process control of critical dimensions in lithography |
title_short |
Equipment design and process control of critical dimensions in lithography |
title_full |
Equipment design and process control of critical dimensions in lithography |
title_fullStr |
Equipment design and process control of critical dimensions in lithography |
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Equipment design and process control of critical dimensions in lithography |
title_sort |
equipment design and process control of critical dimensions in lithography |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/70194 |
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