Equipment design and process control of critical dimensions in lithography

• Main Authors: Ngo, Y.S., Yang, G., Putra, A.S., Ang, K.T., Tay, A., Fang, Z.P.
• Other Authors: DEAN'S OFFICE (ENGINEERING)
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/70194
• Institution: National University of Singapore

10.1109/ICCA.2010.5524378