In-situ measurement and control for photoresist processing in microlithography

In-situ measurement and control for photoresist processing in microlithography

AIChE Annual Meeting, Conference Proceedings

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Bibliographic Details
Main Authors: Tay, A., Ho, W.-K., Wu, X., Kiew, C.-M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Microlithography
Photoresist Processing
Semiconductor Manufacturing
Temperature Control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70609
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Institution: National University of Singapore
Description
Summary:AIChE Annual Meeting, Conference Proceedings

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