Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing

Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing

10.1116/1.3117354

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Bibliographic Details
Main Authors: Chua, H.T., Tay, A., Wang, Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70618
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Institution: National University of Singapore
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Summary:10.1116/1.3117354

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