Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing
10.1116/1.3117354
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2014
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sg-nus-scholar.10635-706182023-10-31T07:17:17Z Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing Chua, H.T. Tay, A. Wang, Y. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.3117354 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 27 3 1211-1214 JVTBD 2014-06-19T03:14:13Z 2014-06-19T03:14:13Z 2009 Conference Paper Chua, H.T., Tay, A., Wang, Y. (2009). Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 27 (3) : 1211-1214. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3117354 10711023 http://scholarbank.nus.edu.sg/handle/10635/70618 000266500300036 Scopus |
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National University of Singapore |
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NUS Library |
| continent |
Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
10.1116/1.3117354 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Chua, H.T. Tay, A. Wang, Y. |
| format |
Conference or Workshop Item |
| author |
Chua, H.T. Tay, A. Wang, Y. |
| spellingShingle |
Chua, H.T. Tay, A. Wang, Y. Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing |
| author_sort |
Chua, H.T. |
| title |
Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing |
| title_short |
Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing |
| title_full |
Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing |
| title_fullStr |
Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing |
| title_full_unstemmed |
Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing |
| title_sort |
integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/70618 |
| _version_ |
1781783171493265408 |