Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers

Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers

10.1109/ISDRS.2007.4422245

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Bibliographic Details
Main Authors: Lim, A.E.-J., Fang, W.-W., Liu, F., Lee, R.T.P., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70646
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/70646

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