Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers

• Main Authors: Lim, A.E.-J., Fang, W.-W., Liu, F., Lee, R.T.P., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/70646
• Institution: National University of Singapore

10.1109/ISDRS.2007.4422245