Work function engineering within a single metal gate stack: Manipulating terbium- and aluminum-induced interface dipoles of opposing polarity

10.1109/TED.2008.2011572

Saved in:
Bibliographic Details
Main Authors: Lim, A.E.-J., Kwong, D.-L., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83277
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore