Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers

10.1109/ISDRS.2007.4422245

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Main Authors: Lim, A.E.-J., Fang, W.-W., Liu, F., Lee, R.T.P., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70646
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-706462015-01-13T09:08:04Z Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers Lim, A.E.-J. Fang, W.-W. Liu, F. Lee, R.T.P. Samudra, G.S. Kwong, D.-L. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ISDRS.2007.4422245 2007 International Semiconductor Device Research Symposium, ISDRS - 2014-06-19T03:14:32Z 2014-06-19T03:14:32Z 2007 Conference Paper Lim, A.E.-J.,Fang, W.-W.,Liu, F.,Lee, R.T.P.,Samudra, G.S.,Kwong, D.-L.,Yeo, Y.-C. (2007). Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers. 2007 International Semiconductor Device Research Symposium, ISDRS : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ISDRS.2007.4422245" target="_blank">https://doi.org/10.1109/ISDRS.2007.4422245</a> 1424418917 http://scholarbank.nus.edu.sg/handle/10635/70646 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1109/ISDRS.2007.4422245
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Lim, A.E.-J.
Fang, W.-W.
Liu, F.
Lee, R.T.P.
Samudra, G.S.
Kwong, D.-L.
Yeo, Y.-C.
format Conference or Workshop Item
author Lim, A.E.-J.
Fang, W.-W.
Liu, F.
Lee, R.T.P.
Samudra, G.S.
Kwong, D.-L.
Yeo, Y.-C.
spellingShingle Lim, A.E.-J.
Fang, W.-W.
Liu, F.
Lee, R.T.P.
Samudra, G.S.
Kwong, D.-L.
Yeo, Y.-C.
Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers
author_sort Lim, A.E.-J.
title Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers
title_short Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers
title_full Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers
title_fullStr Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers
title_full_unstemmed Interface dipole mechanism and NMOS Ni-FUSI gate work function engineering using rare-earth metal (RE)-based dielectric interlayers
title_sort interface dipole mechanism and nmos ni-fusi gate work function engineering using rare-earth metal (re)-based dielectric interlayers
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/70646
_version_ 1681087238241255424