Localization of Cu/low-k interconnect reliability defects by pulsed laser induced technique

Conference Proceedings from the International Symposium for Testing and Failure Analysis

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Bibliographic Details
Main Authors: Tan, T.L., Quah, A.C.T., Gan, C.L., Phang, J.C.H., Chua, C.M., Ng, C.M., Du, A.-Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70818
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Institution: National University of Singapore