Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry

Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry

10.1117/12.2013413

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Bibliographic Details
Main Authors: Chin, H.-C., Ling, M.-L., Liu, B., Zhang, X., Li, J., Liu, Y., Hu, J., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Ellipsometry
FinFET
Germanium
OCD
Optical critical dimension
Scatterometry
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70922
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-709222023-10-25T22:40:07Z Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry Chin, H.-C. Ling, M.-L. Liu, B. Zhang, X. Li, J. Liu, Y. Hu, J. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Ellipsometry FinFET Germanium OCD Optical critical dimension Scatterometry 10.1117/12.2013413 Proceedings of SPIE - The International Society for Optical Engineering 8681 - PSISD 2014-06-19T03:17:49Z 2014-06-19T03:17:49Z 2013 Conference Paper Chin, H.-C., Ling, M.-L., Liu, B., Zhang, X., Li, J., Liu, Y., Hu, J., Yeo, Y.-C. (2013). Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry. Proceedings of SPIE - The International Society for Optical Engineering 8681 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.2013413 9780819494634 0277786X http://scholarbank.nus.edu.sg/handle/10635/70922 000323182500102 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Ellipsometry
FinFET
Germanium
OCD
Optical critical dimension
Scatterometry
spellingShingle Ellipsometry
FinFET
Germanium
OCD
Optical critical dimension
Scatterometry
Chin, H.-C.
Ling, M.-L.
Liu, B.
Zhang, X.
Li, J.
Liu, Y.
Hu, J.
Yeo, Y.-C.
Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry
description 10.1117/12.2013413
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Chin, H.-C.
Ling, M.-L.
Liu, B.
Zhang, X.
Li, J.
Liu, Y.
Hu, J.
Yeo, Y.-C.
format Conference or Workshop Item
author Chin, H.-C.
Ling, M.-L.
Liu, B.
Zhang, X.
Li, J.
Liu, Y.
Hu, J.
Yeo, Y.-C.
author_sort Chin, H.-C.
title Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry
title_short Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry
title_full Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry
title_fullStr Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry
title_full_unstemmed Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry
title_sort metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/70922
_version_ 1781783187113902080

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